Selective liner on backside via and method thereof

ABSTRACT

A method includes providing a structure having a substrate, a fin, source/drain (S/D) features, an isolation structure adjacent to sidewalls of the fin, one or more channel layers over a first dielectric layer and connecting the S/D features, and a gate structure engaging the one or more channel layers. The method further includes thinning down the structure from its backside until the fin is exposed and selectively etching the fin to form a trench that exposes surfaces of the S/D features, the first dielectric layer, and the isolation structure. The method further includes forming a silicide feature on the S/D features and depositing an inhibitor on the silicide feature but not on the surface of the first dielectric layer and the isolation structure, depositing a dielectric liner layer on the surfaces of the isolation structure and the first dielectric layer but not on the inhibitor, and selectively removing the inhibitor.

PRIORITY

This claims the benefits to U.S. Provisional Application Ser. No.63/015,322 filed Apr. 24, 2020, the entire disclosure of which isincorporated herein by reference.

BACKGROUND

Conventionally, integrated circuits (IC) are built in a stacked-upfashion, having transistors at the lowest level and interconnect (viasand wires) on top of the transistors to provide connectivity to thetransistors. Power rails (such as metal lines for voltage sources andground planes) are also above the transistors and may be part of theinterconnect. As the integrated circuits continue to scale down, so dothe power rails. This inevitably leads to increased voltage drop acrossthe power rails, as well as increased power consumption of theintegrated circuits. Therefore, although existing approaches insemiconductor fabrication have been generally adequate for theirintended purposes, they have not been entirely satisfactory in allrespects. One area of interest is how to form power rails and vias onthe backside of an IC with reduced resistance.

BRIEF DESCRIPTION OF THE DRAWINGS

The present disclosure is best understood from the following detaileddescription when read with the accompanying figures. It is emphasizedthat, in accordance with the standard practice in the industry, variousfeatures are not drawn to scale and are used for illustration purposesonly. In fact, the dimensions of the various features may be arbitrarilyincreased or reduced for clarity of discussion.

FIGS. 1A and 1B show a flow chart of a method of forming a semiconductordevice with backside power rails and backside vias, according to variousaspects of the present disclosure.

FIGS. 2A, 3A, 4A, 5A, 6A, 7A, 8A, 9A, 10A, 11A, 12A, and 13A illustratetop views of a portion of a semiconductor device, according to someembodiments.

FIGS. 2B, 3B, 4B, 5B, 6B, 7B, 8B, 9B, 10B, 11B, 12B, and 13B illustratecross-sectional views of a portion of the semiconductor device along theB-B line in FIGS. 2A, 3A, 4A, 5A, 6A, 7A, 8A, 9A, 10A, 11A, 12A, and13A, respectively, according to some embodiments.

FIGS. 2C, 4C, 5C, 6C, 7C, 8C, 9C, 10C, 11C, 12C, and 13C illustratecross-sectional views of a portion of the semiconductor device along theC-C line in FIGS. 2A, 4A, 5A, 6A, 7A, 8A, 9A, 10A, 11A, 12A, and 13A,respectively, according to some embodiments.

FIGS. 2D, 4D, 5D, 6D, 7D, 8D, 9D, 10D, 11D, 12D, and 13D illustratecross-sectional views of a portion of the semiconductor device along theD-D line in FIGS. 2A, 4A, 5A, 6A, 7A, 8A, 9A, 10A, 11A, 12A, and 13A,respectively, according to some embodiments.

FIGS. 2E, 4E, 5E, 6E, 7E, 8E, 9E, 10E, 11E, 12E, and 13E illustratecross-sectional views of a portion of the semiconductor device along theE-E line in FIGS. 2A, 4A, 5A, 6A, 7A, 8A, 9A, 10A, 11A, 12A, and 13A,respectively, according to some embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over or on a second feature in the description thatfollows may include embodiments in which the first and second featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly. Still further, when anumber or a range of numbers is described with “about,” “approximate,”and the like, the term encompasses numbers that are within certainvariations (such as +/−10% or other variations) of the number described,in accordance with the knowledge of the skilled in the art in view ofthe specific technology disclosed herein, unless otherwise specified.For example, the term “about 5 nm” may encompass the dimension rangefrom 4.5 nm to 5.5 nm, 4.0 nm to 5.0 nm, etc.

This application generally relates to semiconductor structures andfabrication processes, and more particularly to semiconductor deviceswith backside power rails and backside vias. As discussed above, powerrails in IC need further improvement in order to provide the neededperformance boost as well as reducing power consumption. An object ofthe present disclosure includes providing power rails (or powerroutings) on a back side (or backside) of a structure containingtransistors (such as gate-all-around (GAA) transistors and/or FinFETtransistors) in addition to an interconnect structure (which may includepower rails as well) on a front side (or frontside) of the structure.This increases the number of metal tracks available in the structure fordirectly connecting to source/drain contacts and vias. It also increasesthe gate density for greater device integration than existing structureswithout the backside power rails. The backside power rails may havewider dimension than the first level metal (MO) tracks on the frontsideof the structure, which beneficially reduces the power rail resistance.The present disclosure also provides a backside via structure forconnecting the backside power rails to S/D features on the frontside.The backside via structure has a liner layer that is deposited onsidewalls of a backside via hole but not on the bottom surface of thebackside via hole. This eliminates the step of breaking through theliner layer when depositing conductor into the backside via hole,thereby preventing damages to the backside of the source/drain features.It also increases the area of the source/drain features for silicidationand generally increases the source/drain contact area, thereby reducingsource/drain contact resistance from the backside of the wafer. Thedetails of the structure and fabrication methods of the presentdisclosure are described below in conjunction with the accompanieddrawings, which illustrate a process of making a GAA device, accordingto some embodiments. A GAA device refers to a device havingvertically-stacked horizontally-oriented multi-channel transistors, suchas nanowire transistors and nanosheet transistors. GAA devices arepromising candidates to take CMOS to the next stage of the roadmap dueto their better gate control ability, lower leakage current, and fullyFinFET device layout compatibility. For the purposes of simplicity, thepresent disclosure uses GAA devices as an example. Those of ordinaryskill in the art should appreciate that they may readily use the presentdisclosure as a basis for designing or modifying other processes andstructures (such as FinFET devices) for carrying out the same purposesand/or achieving the same advantages of the embodiments introducedherein.

FIGS. 1A and 1B are a flow chart of a method 100 for fabricating asemiconductor device according to various aspects of the presentdisclosure. Additional processing is contemplated by the presentdisclosure. Additional operations can be provided before, during, andafter method 100, and some of the operations described can be moved,replaced, or eliminated for additional embodiments of method 100.

Method 100 is described below in conjunction with FIG. 2A through FIG.13E that illustrate various top and cross-sectional views of asemiconductor device (or a semiconductor structure) 200 at various stepsof fabrication according to the method 100, in accordance with someembodiments. In some embodiments, the device 200 is a portion of an ICchip, a system on chip (SoC), or portion thereof, that includes variouspassive and active microelectronic devices such as resistors,capacitors, inductors, diodes, p-type field effect transistors (PFETs),n-type field effect transistors (NFETs), FinFET, nanosheet FETs,nanowire FETs, other types of multi-gate FETs, metal-oxide semiconductorfield effect transistors (MOSFETs), complementary metal-oxidesemiconductor (CMOS) transistors, bipolar junction transistors (BJTs),laterally diffused MOS (LDMOS) transistors, high voltage transistors,high frequency transistors, memory devices, other suitable components,or combinations thereof. FIGS. 2A through 13E have been simplified forthe sake of clarity to better understand the inventive concepts of thepresent disclosure. Additional features can be added in the device 200,and some of the features described below can be replaced, modified, oreliminated in other embodiments of the device 200.

At operation 102, the method 100 (FIG. 1A) provides semiconductor device200 having a substrate 201 and transistors built on a frontside of thesubstrate 201. FIG. 2A illustrates a top view of the device 200, andFIGS. 2B, 2C, 2D, and 2E illustrate cross-sectional views of the device200, in portion, along the B-B line, the C-C line, the D-D line, and theE-E line in FIG. 2A, respectively. Particularly, the B-B line is cutalong the lengthwise direction of a semiconductor fin 204 (direction“X”), the C-C line is cut along the lengthwise direction of a gate stack240 (direction “Y”), the D-D line is cut into the source regions of thetransistors and is parallel to the gate stacks 240, and the E-E line iscut into the drain regions of the transistors and is parallel to thegate stacks 240. The B-B lines, C-C lines, D-D lines, and E-E lines inFIGS. 3A through 13A are similarly configured.

Referring to FIGS. 2A-2E, the semiconductor device 200 includes thesubstrate 201 at its backside and various elements built on the frontsurface of the substrate 201. These elements include an isolationstructure 230 over the substrate 201, a semiconductor fin 204 extendingfrom the substrate 201 and adjacent to the isolation structure 230, twoepitaxial source/drain (S/D) features 260 over the semiconductor fin204, one or more channel semiconductor layers 215 suspended over thesemiconductor fin 204 and connecting the two S/D features 260, a gatestack 240 between the two S/D features 260 and wrapping around each ofthe channel layers 215, and a bottom self-aligned capping (B-SAC) layer203 disposed between the semiconductor fin 204 and both the channellayers 215 and the gate stack 240. The semiconductor device 200 furtherincludes inner spacers 255 between the S/D features 260 and the gatestack 240, a (outer) gate spacer 247 over sidewalls of the gate stack240 and over the topmost channel layer 215, a contact etch stop layer(CESL) 269 adjacent to the gate spacer 247 and over the epitaxial S/Dfeatures 260 and the isolation structure 230, an inter-layer dielectric(ILD) layer 270 over the CESL 269. Over the gate stack 240, thesemiconductor device 200 further includes a self-aligned capping layer352. Over the S/D features 260, the semiconductor device 200 furtherincludes silicide features 273, S/D contacts 275, dielectric S/D cappinglayer 356, and S/D contact via 358. In the depicted embodiment, the S/Dcapping layer 356 is disposed over the source feature 260, and the S/Dcontact via 358 is disposed over the drain feature 260. In alternativeembodiments, the S/D capping layer 356 may be disposed over the drainfeature 260, and the S/D contact via 358 may be disposed over the sourcefeature 260. In some embodiments, the S/D capping layer 356 may bedisposed over both the source and the drain features 260. In someembodiments the S/D contact vias 358 may be disposed over both thesource and the drain features 260.

Referring to FIGS. 3A and 3B, the semiconductor device 200 furtherincludes one or more interconnect layers (denoted with 277) with wiresand vias embedded in dielectric layers. The one or more interconnectlayers connecting gate, source, and drain electrodes of varioustransistors, as well as other circuits in the device 200, to form anintegrated circuit in part or in whole. The semiconductor device 200 mayfurther include passivation layers, adhesion layers, and/or other layersbuilt on the frontside of the semiconductor device 200. These layers andthe one or more interconnect layers are collectively denoted with thelabel 277. It is noted that the semiconductor device 200 is flippedupside down in FIG. 3B. The various elements of the semiconductor device200 are further described below.

In an embodiment, the substrate 201 is a bulk silicon substrate (i.e.,including bulk single-crystalline silicon). The substrate 201 mayinclude other semiconductor materials in various embodiment, such asgermanium, silicon carbide, gallium arsenide, gallium phosphide, indiumphosphide, indium arsenide, indium antimonide, SiGe, GaAsP, AlInAs,AlGaAs, GalnAs, GaInP, GaInAsP, or combinations thereof. In analternative embodiment, substrate 201 is a semiconductor-on-insulatorsubstrate, such as a silicon-on-insulator (SOI) substrate, a silicongermanium-on-insulator (SGOI) substrate, or a germanium-on-insulator(GOI) substrate.

In embodiments, the semiconductor fin 204 may include silicon, silicongermanium, germanium, or other suitable semiconductor, and may be dopedn-type or p-type dopants. The fin 204 may be patterned by any suitablemethod. For example, the fin 204 may be patterned using one or morephotolithography processes, including double-patterning ormulti-patterning processes. Generally, double-patterning ormulti-patterning processes combine photolithography and self-alignedprocesses, allowing patterns to be created that have, for example,pitches smaller than what is otherwise obtainable using a single, directphotolithography process. For example, in one embodiment, a sacrificiallayer is formed over a substrate and patterned using a photolithographyprocess. Spacers are formed alongside the patterned sacrificial layerusing a self-aligned process. The sacrificial layer is then removed, andthe remaining spacers, or mandrels, may then be used as a maskingelement for patterning the fin 204. For example, the masking element maybe used for etching recesses into semiconductor layers over or in thesubstrate 201, leaving the fin 204 on the substrate 201. The etchingprocess may include dry etching, wet etching, reactive ion etching(RIE), and/or other suitable processes. For example, a dry etchingprocess may implement an oxygen-containing gas, a fluorine-containinggas (e.g., CF₄, SF₆, CH₂F₂, CHF₃, and/or C₂F₆), a chlorine-containinggas (e.g., Cl₂, CHCl₃, CCl₄, and/or BCl₃), a bromine-containing gas(e.g., HBr and/or CHBr₃), an iodine-containing gas, other suitable gasesand/or plasmas, and/or combinations thereof. For example, a wet etchingprocess may comprise etching in diluted hydrofluoric acid (DHF);potassium hydroxide (KOH) solution; ammonia; a solution containinghydrofluoric acid (HF), nitric acid (HNO₃), and/or acetic acid(CH₃COOH); or other suitable wet etchant. Numerous other embodiments ofmethods to form the fin 204 may be suitable.

The isolation features 230 may include silicon oxide, silicon nitride,silicon oxynitride, other suitable isolation material (for example,including silicon, oxygen, nitrogen, carbon, or other suitable isolationconstituent), or combinations thereof. Isolation features 230 caninclude different structures, such as shallow trench isolation (STI)structures and/or deep trench isolation (DTI) structures. In anembodiment, the isolation features 230 can be formed by filling thetrenches between fins 204 with insulator material (for example, by usinga CVD process or a spin-on glass process), performing a chemicalmechanical polishing (CMP) process to remove excessive insulatormaterial and/or planarize a top surface of the insulator material layer,and etching back the insulator material layer to form isolation features230. In some embodiments, isolation features 230 include a multi-layerstructure, such as a silicon nitride layer disposed over a thermal oxideliner layer.

The S/D features 260 include epitaxially grown semiconductor materialssuch as epitaxially grown silicon, germanium, or silicon germanium. TheS/D features 260 can be formed by any epitaxy processes includingchemical vapor deposition (CVD) techniques (for example, vapor phaseepitaxy and/or Ultra-High Vacuum CVD), molecular beam epitaxy, othersuitable epitaxial growth processes, or combinations thereof. The S/Dfeatures 260 may be doped with n-type dopants and/or p-type dopants. Insome embodiments, for n-type transistors, the S/D features 260 includesilicon and can be doped with carbon, phosphorous, arsenic, other n-typedopant, or combinations thereof (for example, forming Si:C epitaxial S/Dfeatures, Si:P epitaxial S/D features, or Si:C:P epitaxial S/Dfeatures). In some embodiments, for p-type transistors, the S/D features260 include silicon germanium or germanium, and can be doped with boron,other p-type dopant, or combinations thereof (for example, formingSi:Ge:B epitaxial S/D features). The S/D features 260 may includemultiple epitaxial semiconductor layers having different levels ofdopant density. In some embodiments, annealing processes (e.g., rapidthermal annealing (RTA) and/or laser annealing) are performed toactivate dopants in the epitaxial S/D features 260.

In embodiments, the channel layers 215 includes a semiconductor materialsuitable for transistor channels, such as silicon, silicon germanium, orother semiconductor material(s). The channel layers 215 may be in theshape of rods, bars, sheets, or other shapes in various embodiments. Inan embodiment, the channel layers 215 are initially part of a stack ofsemiconductor layers that include the channel layers 215 and other(sacrificial) semiconductor layers alternately stacked layer-by-layer.The sacrificial semiconductor layers and the channel layers 215 includedifferent material compositions (such as different semiconductormaterials, different constituent atomic percentages, and/or differentconstituent weight percentages) to achieve etching selectivity. During agate replacement process to form the gate stack 240, the sacrificialsemiconductor layers are selectively removed, leaving the channel layers215 suspended over the semiconductor fin 204.

In some embodiments, the inner spacer layer 255 includes a dielectricmaterial that includes silicon, oxygen, carbon, nitrogen, other suitablematerial, or combinations thereof (for example, silicon oxide, siliconnitride, silicon oxynitride, silicon carbide, or siliconoxycarbonitride). In some embodiments, the inner spacer layer 255includes a low-k dielectric material, such as those described herein.The inner spacer layer 255 may be formed by deposition and etchingprocesses. For example, after S/D trenches are etched and before the S/Dfeatures 260 are epitaxially grown from the S/D trenches, an etchprocess may be used to recess the sacrificial semiconductor layersbetween the adjacent channel layers 215 to form gaps vertically betweenthe adjacent channel layers 215. Then, one or more dielectric materialsare deposited (using CVD or ALD for example) to fill the gaps. Anotheretching process is performed to remove the dielectric materials outsidethe gaps, thereby forming the inner spacer layer 255.

In some embodiments, the B-SAC layer 203 may include one or more ofLa₂O₃, Al₂O₃, SiOCN, SiOC, SiCN, SiO₂, ZnO, ZrN, Zr₂Al₃O₉, TiO₂, TaO₂,ZrO₂, HfO₂, Si₃N₄, Y₂O₃, AlON, TaCN, ZrSi, and other suitablematerial(s). In some embodiments, the B-SAC layer 203 may include alow-k dielectric material such as a dielectric material including Si, O,N, and C. Exemplary low-k dielectric materials include FSG, carbon dopedsilicon oxide, Black Diamond® (Applied Materials of Santa Clara,Calif.), Xerogel, Aerogel, amorphous fluorinated carbon, Parylene, BCB,SILK (Dow Chemical, Midland, Mich.), polyimide, or combinations thereof.The B-SAC layer 203 may be deposited using CVD, ALD, PVD, or oxidation.In an embodiment, the B-SAC layer 203 is initially deposited on thesemiconductor fin 204 and is patterned using the same process thatpatterns the semiconductor fin 204. In another embodiment, a sacrificialsemiconductor layer (such as SiGe) is initially deposited on thesemiconductor fin 204 and is patterned using the same process thatpatterns the semiconductor fin 204. The sacrificial layer is removed andreplaced with the B-SAC layer 203 during a gate replacement process thatforms the gate stack 240. The B-SAC layer 203 serves to isolate thechannel layers 215 and the gate stack 240 from the backside vias to beformed in subsequent processes. In some embodiments, the B-SAC layer 203may have a thickness d5 in a range of 0.5 nm to about 50 nm. In someembodiment, if the B-SAC layer 203 is too thin (such as less than 0.5nm), then it may not provide sufficient isolation to the channel layers215 and the gate stack 240. In some embodiment, if the B-SAC layer 203is too thick (such as more than 50 nm), then the backside vias would belong and the resistance thereof would be high, which will be furtherdiscussed later.

In the depicted embodiment, the gate stack 240 includes a gatedielectric layer 349 and the gate electrode 350. The gate dielectriclayer 349 may include a high-k dielectric material such as HfO₂, HfSiO,HfSiO₄, HfSiON, HfLaO, HfTaO, HfTiO, HfZrO, HfAlO_(x), ZrO, ZrO₂,ZrSiO₂, AlO, AlSiO, Al₂O₃, TiO, TiO₂, LaO, LaSiO, Ta₂O₃, Ta₂O₅, Y₂O₃,SrTiO₃, BaZrO, BaTiO₃ (BTO), (Ba,Sr)TiO₃ (BST), Si₃N₄, hafniumdioxide-alumina (HfO₂—Al₂O₃) alloy, other suitable high-k dielectricmaterial, or combinations thereof. High-k dielectric material generallyrefers to dielectric materials having a high dielectric constant, forexample, greater than that of silicon oxide (k≈3.9). The gate dielectriclayer 349 may be formed by chemical oxidation, thermal oxidation, atomiclayer deposition (ALD), chemical vapor deposition (CVD), and/or othersuitable methods. In some embodiments, the gate stack 240 furtherincludes an interfacial layer between the gate dielectric layer 349 andthe channel layers 215. The interfacial layer may include silicondioxide, silicon oxynitride, or other suitable materials. In someembodiments, the gate electrode layer 350 includes an n-type or a p-typework function layer and a metal fill layer. For example, an n-type workfunction layer may comprise a metal with sufficiently low effective workfunction such as titanium, aluminum, tantalum carbide, tantalum carbidenitride, tantalum silicon nitride, or combinations thereof. For example,a p-type work function layer may comprise a metal with a sufficientlylarge effective work function, such as titanium nitride, tantalumnitride, ruthenium, molybdenum, tungsten, platinum, or combinationsthereof. For example, a metal fill layer may include aluminum, tungsten,cobalt, copper, and/or other suitable materials. The gate electrodelayer 350 may be formed by CVD, PVD, plating, and/or other suitableprocesses. Since the gate stack 240 includes a high-k dielectric layerand metal layer(s), it is also referred to as a high-k metal gate.

In an embodiment, the gate spacer 247 includes a dielectric materialsuch as a dielectric material including silicon, oxygen, carbon,nitrogen, other suitable material, or combinations thereof (e.g.,silicon oxide, silicon nitride, silicon oxynitride (SiON), siliconcarbide, silicon carbon nitride (SiCN), silicon oxycarbide (SiOC),silicon oxycarbon nitride (SiOCN)). In embodiments, the gate spacer 247may include La₂O₃, Al₂O₃, SiOCN, SiOC, SiCN, SiO₂, SiC, ZnO, ZrN,Zr₂Al₃O₉, TiO₂, TaO₂, ZrO₂, HfO₂, Si₃N₄, Y₂O₃, AlON, TaCN, ZrSi, orother suitable material(s). For example, a dielectric layer includingsilicon and nitrogen, such as a silicon nitride layer, can be depositedover a dummy gate stack (which is subsequently replaced by the high-kmetal gate 240) and subsequently etched (e.g., anisotropically etched)to form gate spacers 247. In some embodiments, gate spacers 247 includea multi-layer structure, such as a first dielectric layer that includessilicon nitride and a second dielectric layer that includes siliconoxide. In some embodiments, more than one set of spacers, such as sealspacers, offset spacers, sacrificial spacers, dummy spacers, and/or mainspacers, are formed adjacent to the gate stack 240. In embodiments, thegate spacer 247 may have a thickness of about 1 nm to about 40 nm, forexample.

In some embodiments, the SAC layer 352 includes La₂O₃, Al₂O₃, SiOCN,SiOC, SiCN, SiO₂, SiC, ZnO, ZrN, Zr₂Al₃O₉, TiO₂, TaO₂, ZrO₂, HfO₂,Si₃N₄, Y₂O₃, AlON, TaCN, ZrSi, or other suitable material(s). The SAClayer 352 protects the gate stacks 240 from etching and CMP processesthat are used for etching S/D contact holes. The SAC layer 352 may beformed by recessing the gate stacks 240 and optionally recessing thegate spacers 247, depositing one or more dielectric materials over therecessed gate stacks 240 and optionally over the recessed gate spacers247, and performing a CMP process to the one or more dielectricmaterials. The SAC layer 352 may have a thickness in a range of about 3nm to about 30 nm, for example.

In embodiments, the CESL 269 may include La₂O₃, Al₂O₃, SiOCN, SiOC,SiCN, SiO₂, SiC, ZnO, ZrN, Zr₂Al₃O₉, TiO₂, TaO₂, ZrO₂, HfO₂, Si₃N₄,Y₂O₃, AlON, TaCN, ZrSi, or other suitable material(s); and may be formedby CVD, PVD, ALD, or other suitable methods. The ILD layer 270 maycomprise tetraethylorthosilicate (TEOS) oxide, un-doped silicate glass,or doped silicon oxide such as borophosphosilicate glass (BPSG),fluoride-doped silica glass (FSG), phosphosilicate glass (PSG), borondoped silicon glass (BSG), a low-k dielectric material, other suitabledielectric material, or combinations thereof. The ILD 270 may be formedby PECVD (plasma enhanced CVD), FCVD (flowable CVD), or other suitablemethods.

In some embodiments, the silicide features 273 may include titaniumsilicide (TiSi), nickel silicide (NiSi), tungsten silicide (WSi),nickel-platinum silicide (NiPtSi), nickel-platinum-germanium silicide(NiPtGeSi), nickel-germanium silicide (NiGeSi), ytterbium silicide(YbSi), platinum silicide (PtSi), iridium silicide (IrSi), erbiumsilicide (ErSi), cobalt silicide (CoSi), or other suitable compounds.

In an embodiment, the S/D contacts 275 may include a conductive barrierlayer and a metal fill layer over the conductive barrier layer. Theconductive barrier layer may include titanium (Ti), tantalum (Ta),tungsten (W), cobalt (Co), ruthenium (Ru), or a conductive nitride suchas titanium nitride (TiN), titanium aluminum nitride (TiAlN), tungstennitride (WN), tantalum nitride (TaN), or combinations thereof, and maybe formed by CVD, PVD, ALD, and/or other suitable processes. The metalfill layer may include tungsten (W), cobalt (Co), molybdenum (Mo),ruthenium (Ru), nickel (Ni), copper (Cu), or other metals, and may beformed by CVD, PVD, ALD, plating, or other suitable processes. In someembodiments, the conductive barrier layer is omitted in the S/D contacts275.

In some embodiments, the capping layer 356 includes La₂O₃, Al₂O₃, SiOCN,SiOC, SiCN, SiO₂, SiC, ZnO, ZrN, Zr₂Al₃O₉, TiO₂, TaO₂, ZrO₂, HfO₂,Si₃N₄, Y₂O₃, AlON, TaCN, ZrSi, or other suitable material(s). Thecapping layer 356 protects the S/D contacts 275 from etching and CMPprocesses and isolating the S/D contacts 275 from the interconnectstructure formed thereon. The capping layer 356 may have a thickness ina range of about 3 nm to about 30 nm, for example. In some embodiments,the SAC layer 352 and the capping layer 356 include different materialsto achieve etch selectivity, for example, during the formation of thecapping layer 356.

In an embodiment, the S/D contact via 358 may include a conductivebarrier layer and a metal fill layer over the conductive barrier layer.The conductive barrier layer may include titanium (Ti), tantalum (Ta),tungsten (W), cobalt (Co), ruthenium (Ru), or a conductive nitride suchas titanium nitride (TiN), titanium aluminum nitride (TiAlN), tungstennitride (WN), tantalum nitride (TaN), or combinations thereof, and maybe formed by CVD, PVD, ALD, and/or other suitable processes. The metalfill layer may include tungsten (W), cobalt (Co), molybdenum (Mo),ruthenium (Ru), nickel (Ni), copper (Cu), or other metals, and may beformed by CVD, PVD, ALD, plating, or other suitable processes. In someembodiments, the conductive barrier layer is omitted in the S/D contactvia 358.

At operation 104, the method 100 (FIG. 1A) flips the device 200 upsidedown and attaches the frontside of the device 200 to a carrier 370, suchas shown in FIG. 3B. This makes the device 200 accessible from thebackside of the device 200 for further processing. The operation 104 mayuse any suitable attaching processes, such as direct bonding, hybridbonding, using adhesive, or other bonding methods. The operation 104 mayfurther include alignment, annealing, and/or other processes. Thecarrier 370 may be a silicon wafer in some embodiment. In FIGS. 2A-13E,the “z” direction points from the backside of the device 200 to thefrontside of the device 200, while the “−z” direction points from thefrontside of the device 200 to the backside of the device 200.

At operation 106, the method 100 (FIG. 1A) thins down the device 200from the backside of the device 200 until the semiconductor fin 204 andthe isolation structure 230 are exposed from the backside of the device200. The resultant structure is shown in FIGS. 4A-4E according to anembodiment. For simplicity, FIGS. 4C, 4D, and 4E omit some features thatare already shown in FIG. 4B, particularly the layer 277 and the carrier370. The thinning process may include a mechanical grinding processand/or a chemical thinning process. A substantial amount of substratematerial may be first removed from the substrate 201 during a mechanicalgrinding process. Afterwards, a chemical thinning process may apply anetching chemical to the backside of the substrate 201 to further thindown the substrate 201.

At operation 108, the method 100 (FIG. 1A) selectively etches thesemiconductor layer 204 to form trenches 272 over the backside of thegate stack 240 and the S/D features 260. The trenches 272 exposesurfaces of the S/D features 260 from the backside. In the presentembodiment, the operation 108 further forms a silicide feature 280 overthe surfaces of the S/D features 260. The resultant structure is shownin FIGS. 5A-5E according to an embodiment. In the present embodiment,the operation 108 applies an etching process that is tuned to beselective to the materials of the semiconductor layer 204 and with no(or minimal) etching to the gate stacks 240, the isolation structure230, and the B-SAC layer 203. In the present embodiment, the etchingprocess also etches the S/D features 260 to recess it to a level that iseven with or below the interface between the isolation structure 230 andthe CESL 269. This is for preparing the trenches 272 for subsequentliner deposition. In some embodiments, the operation 108 may apply morethan one etching processes. For example, it may apply a first etchingprocess to selectively remove the semiconductor fin 204, and then applya second etching process to selectively recess the S/D features 260 tothe desired level, where the first and the second etching processes usedifferent etching parameters such as using different etchants. Theetching process(es) can be dry etching, wet etching, reactive ionetching, or other etching methods. The B-SAC layer 203 protects the gatestack 240 from the one or more etching processes. In an embodiment, theoperation 108 includes depositing one or more metals into the trenches272, performing an annealing process to the device 200 to cause reactionbetween the one or more metals and the S/D features 260 to produce thesilicide feature 280, and removing un-reacted portions of the one ormore metals, leaving the silicide feature 280 in the trenches 272. Theone or more metals may include titanium (Ti), tantalum (Ta), tungsten(W), nickel (Ni), platinum (Pt), ytterbium (Yb), iridium (Ir), erbium(Er), cobalt (Co), or a combination thereof (e.g., an alloy of two ormore metals) and may be deposited using CVD, PVD, ALD, or other suitablemethods. The silicide feature 280 may include titanium silicide (TiSi),nickel silicide (NiSi), tungsten silicide (WSi), nickel-platinumsilicide (NiPtSi), nickel-platinum-germanium silicide (NiPtGeSi),nickel-germanium silicide (NiGeSi), ytterbium silicide (YbSi), platinumsilicide (PtSi), iridium silicide (IrSi), erbium silicide (ErSi), cobaltsilicide (CoSi), a combination thereof, or other suitable compounds.

At operation 110, the method 100 (FIG. 1A) selectively deposits aninhibitor 302 over the backside of the S/D features 260, morespecifically, over the silicide feature 280 in the present embodiment.The resultant structure is shown in FIGS. 6A-6E according to anembodiment. The inhibitor 302 includes an organic or organic-like filmthat includes amphiphilic or amphiphilic-like molecules. Referring toFIGS. 6B-6E, the inhibitor 302 is deposited on the silicide feature 280,but not on the dielectric layers 230, 203, and 255. It is noted that theinhibitor 302 may or may not touch the CESL 269 and the isolationstructure 230 in a corner area 327 where the S/D features 260 and/or thesilicide features 280 meet the CESL 269 and the isolation structure 230.In an embodiment, the inhibitor 302 is deposited on the surface of thesilicide feature 280 due to covalent bonds between the molecules of thesilicide feature 280 and the molecules of the inhibitor 302. Suchcovalent bonds do not exist between the dielectric surfaces of thelayers 230, 203, and 255 and the inhibitor 302. Thus, the inhibitor 302is not deposited over these dielectric surfaces. The inhibitor 302further has a hydrophobic property such that it is not attachable to adielectric material (i.e., it repels the deposition of a dielectricmaterial thereon), which will be further explained with reference to theoperation 112. For example, the inhibitor 302 may include a compound ofalkyl chain or carboxylic acid in some embodiment or may have a chemicalformula of SHCH2C6H4CH2SH, or HS—(CH2)n-COOH in some embodiment. Theinhibitor 302 may be deposited using ALD, PVD, CVD, or other suitablemethods and may have a thickness (along the “z” direction) of about 0.5nm to 5 nm. In the present embodiment, the inhibitor 302 is depositedonly on selected surfaces (i.e., the surfaces of the silicide feature280) without involving a photolithography process. Thus, the operation110 is a selective deposition process.

At operation 112, the method 100 (FIG. 1A) selectively deposits adielectric liner layer 304 on the backside of the structure 200. Theresultant structure is shown in FIGS. 7A-7E according to an embodiment.Referring to FIGS. 7A-7E, the dielectric liner layer 304 is deposited tohave a substantially uniform thickness along the various surfaces of theB-SAC layer 203, the isolation structure 230, and the inner spacers 255in this embodiment. Due to the hydrophobic property of the inhibitor302, the dielectric liner layer 304 is not deposited on the inhibitor302 except some edge areas of the inhibitor 302 (such as the portion ofthe inhibitor 302 in corner areas 327). The dielectric liner layer 304may or may not touch the edge areas of the inhibitor 302. In variousembodiment, the dielectric liner layer 304 may include La2O3, Al2O3,SiOCN, SiOC, SiCN, SiO2, SiC, ZnO, ZrN, Zr2Al3O9, TiO2, TaO2, ZrO2,HfO2, Si3N4, Y2O3, AlON, TaCN, ZrSi, or other suitable material(s). Thedielectric liner layer 304 functions to isolate the S/D contacts(backside vias) that are to be formed in the trenches 272 later (seeFIG. 12D). Without the dielectric liner layer 304, metals from the S/Dcontacts may diffuse into the isolation structure 230 over time to causeissues. The dielectric liner layer 304 also functions to isolation theS/D contacts from the nearby gate stacks 240. The dielectric liner layer304 may be deposited using ALD, CVD, or other suitable methods, and mayhave a thickness of about 1 nm to about 5 nm (e.g., as measured on thesidewalls of the B-SAC layer 203 along the “x” direction) in variousembodiments. In the present embodiment, the dielectric liner layer 304is deposited only on selected surfaces (i.e., the surfaces of theisolation structure 230, the B-SAC layer 203, and the inner spacers 255)without involving a photolithography process. Thus, the operation 112 isa selective deposition process. Particularly, since the dielectric linerlayer 304 is not deposited on the inhibitor 302, a vertical etchingprocess for breaking down the dielectric liner layer 304 is not needed.

At operation 114, the method 100 (FIG. 1B) removes the inhibitor 302from the device 200, particularly from the surfaces of the silicidefeature 280. The resultant structure is shown in FIGS. 8A-8E accordingto an embodiment. Referring to FIGS. 8A-8E, the removal of the inhibitor302 results in gaps (or voids) 333 in the corner areas 327. In thecross-sectional view of FIG. 8B, the gaps 333 exist directly below thedielectric liner layer 304 and above the S/D features 260 and thesilicide feature 280 and expose a portion of the side surface of theinner spacers 255. In the cross-sectional view of FIGS. 8D and 8E, thegaps 333 exist directly below the dielectric liner layer 304 and abovethe silicide feature 280 and expose a portion of the side surface of theisolation structure 230 and/or the CESL 269. In various embodiments, adistance d2 between the bottom surface of the dielectric liner layer 304and the top surface of the silicide feature 280 is in a range of about0.2 nm to about 5 nm. The distance d2 is the height of the gaps 333. Ifthe distance d2 is smaller than 0.2 nm, it will become more difficultfor backside S/D contacts (or S/D via) such as the S/D via 282 (see FIG.12D) to fill in the gap, reducing the interfacial area between the S/Dcontact 282 and the S/D features 260 (and the silicide feature 280) andincreasing S/D contact resistance. If the distance d2 is greater than 5nm, then there may be areas on the isolation structure 230, the B-SAClayer 203, and/or the inner spacers 255 that are not sufficientlycovered by the dielectric liner 304, leading to metal diffusion from theS/D contacts 282 into these dielectric layers. Therefore, having thedistance d2 in the range of 0.2 nm to 5 nm achieves a good balancebetween reducing S/D contact resistance and improving S/D contactisolation.

In an embodiment, the removal of the inhibitor 302 includes a plasma dryetching process, a chemical dry etching process, an ashing process, awet etching process, or a combination thereof. The etching and ashingprocesses are selective to the materials of the inhibitor 302 and haveno (or minimal) etching to the dielectric liner layer 304, the CESL 269,the inner spacer 255, the isolation structure 230, the silicide features280, and the S/D features 260. For example, the plasma dry etchingprocess may use conventional dry etchant for dielectric material such asC4F6 mixed with H2 or O2, the chemical dry etching process may use oneor more chemicals such as H2, the ashing process may use oxygen orhydrogen ashing, and the wet etching process may apply a hot SPMsolution (a mixture of sulfuric acid and hydrogen peroxide), forexample, at a temperate above 100° C.

As a result of the operations 110, 112, and 114, the backside surfacesof the silicide feature 280 are exposed in the trenches 272 and thedielectric liner layer 304 is disposed over various surfaces of theisolation structure 230, the B-SAC layer 203, and the inner spacers 255.In approaches that do not use the inhibitor 302 (i.e., omitting theoperation 110 and 114), the dielectric liner layer 304 would bedeposited not only on the surfaces of the layers 230, 203, and 255, butalso on the silicide feature 280. In order to expose the S/D features260 and/or the silicide feature 280 for subsequent S/D contactformation, an etching process would be performed to etch the dielectricliner layer 304. Sometimes, to ensure that the dielectric liner layer304 is completely removed from the surfaces of the S/D features 260 orthe silicide feature 280, an over-etching would be performed. Theover-etching may lead to unnecessary loss of the B-SAC layer 203 as wellas the S/D features 260 or the silicide feature 280. Loss or thinning ofthe B-SAC layer 203 may lead to short circuit between the gate stack 240and the backside vias (such as the via 282 in FIG. 12D). In contrast, byusing the inhibitor 302, processes according to the present embodimentare more robust and have better control on the thickness of the B-SAClayer 203. Further, due to the presence of the gaps 333, there are moreareas of the S/D features 206 and the silicide feature 280 for makingS/D contacts, thereby reducing S/D contact resistance.

At operation 116, the method 100 (FIG. 1B) deposits a dielectric layer276 with one or more dielectric materials to fill the trenches 272. Inthe present embodiment, the operation 116 performs a CMP process to thedielectric layer 276 and the dielectric liner layer 304 to remove themfrom the top surface of the isolation structure 230. The resultantstructure is shown in FIGS. 9A-9E according to an embodiment. Referringto FIGS. 9A-9E, the dielectric layer 276 is deposited over thedielectric liner layer 304 and the silicide feature 280, and fills thegaps 333. In some embodiments, the dielectric layer 276 may include oneor more of La2O3, Al2O3, SiOCN, SiOC, SiCN, SiO2, SiC, ZnO, ZrN,Zr2Al3O9, TiO2, TaO2, ZrO2, HfO2, Si3N4, Y2O3, AlON, TaCN, ZrSi, orother suitable material(s). Further, in the present embodiment, thedielectric layer 276 and the dielectric liner 304 include differentmaterials to achieve etch selectivity during the backside contact holeetching process. Still further, the dielectric layer 276 and theisolation structure 230 may include different materials so that theisolation structure 230 may act as a CMP stop when the dielectric layer276 is planarized by the CMP process.

At operation 118, the method 100 (FIG. 1B) forms an etch mask 360 overthe backside of the structure 200. The etch mask 360 provides openings362 over the backside of the S/D features 260 that are to be connectedto backside vias. The resultant structure is shown in FIGS. 10A-10Eaccording to an embodiment. Referring to FIGS. 10A-10E, in the depictedembodiment, the opening 362 is provided over the backside of the sourcefeature 260 while the backside of the gate stack 240 and the drainfeature 260 are covered by the etch mask 360. In various embodiments,the openings 362 may be provided over the backside of drain featuresonly, source features only, or both source and drain features. The etchmask 360 includes a material that is different than a material of thedielectric layer 276 to achieve etching selectivity during backside viahole etching. For example, the etch mask 360 includes a resist material(and thus may be referred to as a patterned resist layer and/or apatterned photoresist layer). In some embodiments, the etch mask 360 hasa multi-layer structure, such as a resist layer disposed over ananti-reflective coating (ARC) layer and/or a hard mask layer comprisingsilicon nitride or silicon oxide. The present disclosure contemplatesother materials for the etch mask 360, so long as etching selectivity isachieved during the etching of the dielectric layer 276. In someembodiments, operation 118 uses a lithography process that includesforming a resist layer over the backside of the device 200 (e.g., byspin coating), performing a pre-exposure baking process, performing anexposure process using a mask, performing a post-exposure bakingprocess, and performing a developing process. During the exposureprocess, the resist layer is exposed to radiation energy (e.g., UVlight, DUV light, or EUV light), where the mask blocks, transmits,and/or reflects radiation to the resist layer depending on a maskpattern of the mask and/or mask type (e.g., binary mask, phase shiftmask, or EUV mask), such that an image is projected onto the resistlayer that corresponds with the mask pattern. Since the resist layer issensitive to radiation energy, exposed portions of the resist layerchemically change, and exposed (or non-exposed) portions of the resistlayer are dissolved during the developing process depending oncharacteristics of the resist layer and characteristics of a developingsolution used in the developing process. After development, thepatterned resist layer (e.g., the etch mask 360) includes a resistpattern that corresponds with the mask. Alternatively, the exposureprocess can be implemented or replaced by other methods, such asmaskless lithography, e-beam writing, ion-beam writing, or combinationsthereof.

At operation 120, the method 100 (FIG. 1B) etches the dielectric layer276 through the etch mask 360 to form a via hole 278. The etch mask 360is subsequently removed, for example, by a resist stripping process orother suitable process. The resultant structure is shown in FIGS.11A-11E according to an embodiment. Referring to FIGS. 11A-11E, the viahole 278 exposes the silicide feature 280 on the source feature 260 inthe depicted embodiment. Particularly, the gaps 333 re-appear in thecorner areas 327 inside the via hole 278. In an embodiment, the etchingprocesses include a dry (plasma) etching process that is tuned toselectively etch the dielectric layer 276 and with no (or minimal)etching to the dielectric liner 304, the isolation structure 230, theCESL 269, the inner spacers 255, the silicide feature 280, and the S/Dfeatures 260. In alternative embodiments, the operation 120 may useother types of etching (such as wet etching or reactive ion etching) aslong as the etch selectivity between the layers is achieved as discussedabove. Since the operation 120 has no or minimal etching to theisolation structure 230 and the dielectric liner 304, the via holeetching is self-aligned to the dielectric liner 304 in the y-z plane andin the x-z plane, thereby improving the process margin.

At operation 122, the method 100 (FIG. 1B) forms a via structure (or viaor metal plug) 282 in the via hole 278. The resultant structure is shownin FIGS. 12A-12E according to an embodiment. Referring to FIGS. 12A-12E,the via 282 is disposed over the silicide feature 280.

In an embodiment, the via 282 may include tungsten (W), cobalt (Co),molybdenum (Mo), ruthenium (Ru), copper (Cu), nickel (Ni), titanium(Ti), tantalum (Ta), titanium nitride (TiN), tantalum nitride (TaN), orother metals, and may be formed by CVD, PVD, ALD, plating, or othersuitable processes. The operation 122 may perform a CMP process toremove excessive materials of the via 282.

At operation 124, the method 100 (FIG. 1B) forms backside power rails284. The resultant structure is shown in FIGS. 13A-13B according to anembodiment. As illustrated in FIGS. 13B-13E, the backside via 282 iselectrically connected to the backside power rails 284. In anembodiment, the backside power rails 284 may be formed using a damasceneprocess, a dual-damascene process, a metal patterning process, or othersuitable processes. The backside power rails 284 may include tungsten(W), cobalt (Co), molybdenum (Mo), ruthenium (Ru), copper (Cu), nickel(Ni), titanium (Ti), tantalum (Ta), titanium nitride (TiN), tantalumnitride (TaN), or other metals, and may be deposited by CVD, PVD, ALD,plating, or other suitable processes. Although not shown in FIGS.13A-13E, the backside power rails 284 are embedded in one or moredielectric layers. Having backside power rails 284 beneficiallyincreases the number of metal tracks available in the device 200 fordirectly connecting to source/drain contacts and vias. It also increasesthe gate density for greater device integration than other structureswithout the backside power rails 284. The backside power rails 284 mayhave wider dimension than the first level metal (MO) tracks on thefrontside of the device 200, which beneficially reduces the backsidepower rail resistance. In an embodiment, the backside power rails 284may have a thickness d1 in a range from about 5 nm to about 40 nm, forexample; the dielectric layer 276 may have a thickness d3 in a rangefrom about 3 nm to about 50 nm, for example; and the B-SAC layer 203 hasa thickness d5 in a range from about 0.5 nm to about 50 nm, as discussedabove.

At operation 126, the method 100 (FIG. 1B) performs further fabricationprocesses to the device 200. For example, it may form one or moreinterconnect layers on the backside of the structure 200, formpassivation layers on the backside of the device 200, perform other BEOLprocesses, and remove the carrier 370.

Although not intended to be limiting, embodiments of the presentdisclosure provide one or more of the following advantages. For example,embodiments of the present disclosure form a liner layer for a backsidevia where the liner layer is selectively deposited on sidewalls of a viahole but not on the bottom of the via hole. This eliminates the need tobreak through the liner when subsequently forming the via in the viahole and advantageously reduces the risk of shorting metal gates to thebackside via. Also, embodiments of the present disclosure form backsidevias using a self-aligned process, which minimize the risks of theshorting the backside vias to nearby conductors including the gatestacks. Further, embodiments of the present disclosure form backsidepower rails to increase the number of metal tracks available in anintegrated circuit and increase the gate density for greater deviceintegration. Embodiments of the present disclosure can be readilyintegrated into existing semiconductor manufacturing processes.

In one example aspect, the present disclosure is directed to a methodthat includes providing a structure having a frontside and a backside.The structure includes a substrate, a semiconductor fin over thesubstrate, two source/drain (S/D) features over the semiconductor fin, afirst dielectric layer over the semiconductor fin, an isolationstructure adjacent to sidewalls of the semiconductor fin, one or morechannel semiconductor layers over the first dielectric layer andconnecting the two S/D features, and a gate structure engaging the oneor more channel semiconductor layers. The substrate is at the backsideof the structure and the gate structure is at the frontside of thestructure. The method further includes thinning down the structure fromthe backside of the structure until the semiconductor fin is exposed andselectively etching the semiconductor fin from the backside of thestructure to form a trench. The trench exposes surfaces of the two S/Dfeatures, a surface of the first dielectric layer, and sidewalls of theisolation structure. The method further includes forming a silicidefeature on the surfaces of the S/D features and selectively depositingan inhibitor in the trench. The inhibitor is deposited on the silicidefeature but not on the surface of the first dielectric layer and thesidewalls of the isolation structure. The method further includesselectively depositing a dielectric liner layer in the trench. Thedielectric liner layer is deposited on the sidewalls of the isolationstructure and the surface of the first dielectric layer but not on theinhibitor. The method further includes selectively removing theinhibitor.

In an embodiment, the method further includes depositing a seconddielectric layer to fill the trench; etching the second dielectric layerto form a via hole, the via hole exposing the silicide feature on one ofthe two S/D features and the dielectric liner layer; and forming a viastructure in the via hole. In a further embodiment, before the etchingof the second dielectric layer, the method includes forming an etch maskon the backside of the structure. The etch mask provides an opening overa portion of the second dielectric layer that is below one of the twoS/D features, wherein the etching of the second dielectric layer isperformed through the opening. In a further embodiment, at least aportion of the via structure is formed vertically between the one of thetwo S/D features and the dielectric liner layer.

In some embodiments of the method, the silicide feature includestitanium silicide (TiSi), nickel silicide (NiSi), tungsten silicide(WSi), nickel-platinum silicide (NiPtSi), nickel-platinum-germaniumsilicide (NiPtGeSi), nickel-germanium silicide (NiGeSi), ytterbiumsilicide (YbSi), platinum silicide (PtSi), iridium silicide (IrSi),erbium silicide (ErSi), cobalt silicide (CoSi), or a combinationthereof.

In some embodiments of the method, the inhibitor includes an organicfilm having amphiphilic molecules and the dielectric liner layerincludes at least one of La2O3, Al2O3, SiOCN, SiOC, SiCN, SiO2, SiC,ZnO, ZrN, Zr2Al3O9, TiO2, TaO2, ZrO2, HfO2, Si3N4, Y2O3, AlON, TaCN, andZrSi.

In some embodiments of the method, the selectively removing of theinhibitor uses an etching process that is tuned to etch the inhibitorwith no or minimal etching to the dielectric liner layer. In a furtherembodiment, the selectively removing of the inhibitor includes plasmadry etching, chemical dry etching, ashing, wet etching, or a combinationthereof. In a further embodiment, the selectively removing of theinhibitor includes a wet etching with SPM cleaning solution at atemperature over 100° C.

In another example aspect, the present disclosure is directed to amethod that includes providing a structure having a substrate, asemiconductor fin over the substrate, two source/drain (S/D) featuresover the semiconductor fin, an isolation structure on sidewalls of thesemiconductor fin, a dielectric capping layer over the semiconductorfin, one or more channel semiconductor layers over the dielectriccapping layer, and a gate structure engaging the one or more channelsemiconductor layers. The method further includes thinning down thesubstrate until the semiconductor fin is exposed and selectively etchingthe semiconductor fin to form a trench. The trench exposes surfaces ofthe two S/D features, a surface of the dielectric capping layer, andsidewalls of the isolation structure. The method further includesforming a silicide feature on the surfaces of the S/D features;depositing an inhibitor on the silicide feature but not on the surfaceof the dielectric capping layer and the sidewalls of the isolationstructure; depositing a dielectric liner layer on the sidewalls of theisolation structure and the surface of the dielectric capping layer butnot on the inhibitor; selectively removing the inhibitor; and forming avia structure in the trench.

In an embodiment, after the selectively removing of the inhibitor andbefore the forming of the via structure, the method further includesdepositing a dielectric layer to fill the trench and etching thedielectric layer to form a via hole. The via hole exposes the silicidefeature on one of the two S/D features and the via structure is formedin the via hole. In a further embodiment, before the etching of thedielectric layer, the method includes forming an etch mask on a backsideof the structure. The etch mask provides an opening over a portion ofthe dielectric layer, and the etching of the dielectric layer isperformed through the opening.

In an embodiment of the method, the silicide feature includes titaniumsilicide (TiSi), nickel silicide (NiSi), tungsten silicide (WSi),nickel-platinum silicide (NiPtSi), nickel-platinum-germanium silicide(NiPtGeSi), nickel-germanium silicide (NiGeSi), ytterbium silicide(YbSi), platinum silicide (PtSi), iridium silicide (IrSi), erbiumsilicide (ErSi), and cobalt silicide (CoSi), or a combination thereof.

In some embodiments of the method, the inhibitor includes an organicfilm having amphiphilic molecules and the dielectric liner layerincludes at least one of La2O3, Al2O3, SiOCN, SiOC, SiCN, SiO2, SiC,ZnO, ZrN, Zr2Al3O9, TiO2, TaO2, ZrO2, HfO2, Si3N4, Y2O3, AlON, TaCN, andZrSi.

In some embodiments of the method, the selectively removing of theinhibitor includes plasma dry etching, chemical dry etching, ashing, wetetching, or a combination thereof.

In yet another example aspect, the present disclosure is directed to asemiconductor structure. The semiconductor structure includes twosource/drain (S/D) features; one or more channel semiconductor layersconnecting the two S/D features; and a gate structure engaging the oneor more channel semiconductor layers. The two S/D features, the one ormore channel semiconductor layer, and the gate structure are at afrontside of the semiconductor structure. The semiconductor structurefurther includes a metal track at a backside of the semiconductorstructure; a first dielectric layer between the metal track and the oneor more channel semiconductor layers; a dielectric liner layer onsurfaces of the first dielectric layer and spaced away from one of thetwo S/D features by a first gap; and a via structure connecting themetal track to one of the two S/D features, wherein a portion of the viastructure is disposed in the first gap.

In an embodiment of the semiconductor structure, the dielectric linerlayer is spaced away from another one of the two S/D features by asecond gap. In a further embodiment, the semiconductor structureincludes a second dielectric layer over the dielectric liner layer,wherein a portion of the second dielectric layer extends from the metaltrack to the other one of the two S/D features and fills the second gap.

In an embodiment, the semiconductor structure further includes asilicide feature between the via structure and the one of the two S/Dfeatures. In another embodiment, the semiconductor structure furtherincludes a second dielectric layer over the dielectric liner layer andbetween the first dielectric layer and the metal track.

The foregoing outlines features of several embodiments so that those ofordinary skill in the art may better understand the aspects of thepresent disclosure. Those of ordinary skill in the art should appreciatethat they may readily use the present disclosure as a basis fordesigning or modifying other processes and structures for carrying outthe same purposes and/or achieving the same advantages of theembodiments introduced herein. Those of ordinary skill in the art shouldalso realize that such equivalent constructions do not depart from thespirit and scope of the present disclosure, and that they may makevarious changes, substitutions, and alterations herein without departingfrom the spirit and scope of the present disclosure.

What is claimed is:
 1. A method, comprising: providing a structurehaving a frontside and a backside, the structure including a substrate,a semiconductor fin over the substrate, two source/drain (S/D) featuresover the semiconductor fin, a first dielectric layer over thesemiconductor fin, an isolation structure adjacent to sidewalls of thesemiconductor fin, one or more channel semiconductor layers over thefirst dielectric layer and connecting the two S/D features, and a gatestructure engaging the one or more channel semiconductor layers, whereinthe substrate is at the backside of the structure and the gate structureis at the frontside of the structure; thinning down the structure fromthe backside of the structure until the semiconductor fin is exposed;selectively etching the semiconductor fin from the backside of thestructure to form a trench, wherein the trench exposes surfaces of thetwo S/D features, a surface of the first dielectric layer, and sidewallsof the isolation structure; forming a silicide feature on the surfacesof the S/D features; selectively depositing an inhibitor in the trench,wherein the inhibitor is deposited on the silicide feature but not onthe surface of the first dielectric layer and the sidewalls of theisolation structure; selectively depositing a dielectric liner layer inthe trench, wherein the dielectric liner layer is deposited on thesidewalls of the isolation structure and the surface of the firstdielectric layer but not on the inhibitor; and selectively removing theinhibitor.
 2. The method of claim 1, further comprising: depositing asecond dielectric layer to fill the trench; etching the seconddielectric layer to form a via hole, the via hole exposing the silicidefeature on one of the two S/D features and the dielectric liner layer;and forming a via structure in the via hole.
 3. The method of claim 2,before the etching of the second dielectric layer, further comprising:forming an etch mask on the backside of the structure, the etch maskproviding an opening over a portion of the second dielectric layer thatis below one of the two S/D features, wherein the etching of the seconddielectric layer is performed through the opening.
 4. The method ofclaim 2, wherein at least a portion of the via structure is formedvertically between the one of the two S/D features and the dielectricliner layer.
 5. The method of claim 1, wherein the silicide featureincludes titanium silicide (TiSi), nickel silicide (NiSi), tungstensilicide (WSi), nickel-platinum silicide (NiPtSi),nickel-platinum-germanium silicide (NiPtGeSi), nickel-germanium silicide(NiGeSi), ytterbium silicide (YbSi), platinum silicide (PtSi), iridiumsilicide (IrSi), erbium silicide (ErSi), cobalt silicide (CoSi), or acombination thereof.
 6. The method of claim 1, wherein the inhibitorincludes an organic film having amphiphilic molecules and the dielectricliner layer includes at least one of La₂O₃, Al₂O₃, SiOCN, SiOC, SiCN,SiO₂, SiC, ZnO, ZrN, Zr₂Al₃O₉, TiO₂, TaO₂, ZrO₂, HfO₂, Si₃N₄, Y₂O₃,AlON, TaCN, and ZrSi.
 7. The method of claim 1, wherein the selectivelyremoving of the inhibitor uses an etching process that is tuned to etchthe inhibitor with no or minimal etching to the dielectric liner layer.8. The method of claim 7, wherein the selectively removing of theinhibitor includes plasma dry etching, chemical dry etching, ashing, wetetching, or a combination thereof.
 9. The method of claim 7, wherein theselectively removing of the inhibitor includes a wet etching with SPMcleaning solution at a temperature over 100° C.
 10. A method,comprising: providing a structure having a substrate, a semiconductorfin over the substrate, two source/drain (S/D) features over thesemiconductor fin, an isolation structure on sidewalls of thesemiconductor fin, a dielectric capping layer over the semiconductorfin, one or more channel semiconductor layers over the dielectriccapping layer, and a gate structure engaging the one or more channelsemiconductor layers; thinning down the substrate until thesemiconductor fin is exposed; selectively etching the semiconductor finto form a trench, wherein the trench exposes surfaces of the two S/Dfeatures, a surface of the dielectric capping layer, and sidewalls ofthe isolation structure; forming a silicide feature on the surfaces ofthe S/D features; depositing an inhibitor on the silicide feature butnot on the surface of the dielectric capping layer and the sidewalls ofthe isolation structure; depositing a dielectric liner layer on thesidewalls of the isolation structure and the surface of the dielectriccapping layer but not on the inhibitor; selectively removing theinhibitor; and forming a via structure in the trench.
 11. The method ofclaim 10, after the selectively removing of the inhibitor and before theforming of the via structure, further comprising: depositing adielectric layer to fill the trench; and etching the dielectric layer toform a via hole, the via hole exposing the silicide feature on one ofthe two S/D features, wherein the via structure is formed in the viahole.
 12. The method of claim 11, before the etching of the dielectriclayer, further comprising: forming an etch mask on a backside of thestructure, the etch mask providing an opening over a portion of thedielectric layer, wherein the etching of the dielectric layer isperformed through the opening.
 13. The method of claim 10, wherein thesilicide feature includes titanium silicide (TiSi), nickel silicide(NiSi), tungsten silicide (WSi), nickel-platinum silicide (NiPtSi),nickel-platinum-germanium silicide (NiPtGeSi), nickel-germanium silicide(NiGeSi), ytterbium silicide (YbSi), platinum silicide (PtSi), iridiumsilicide (IrSi), erbium silicide (ErSi), and cobalt silicide (CoSi), ora combination thereof.
 14. The method of claim 10, wherein the inhibitorincludes an organic film having amphiphilic molecules and the dielectricliner layer includes at least one of La₂O₃, Al₂O₃, SiOCN, SiOC, SiCN,SiO₂, SiC, ZnO, ZrN, Zr₂Al₃O₉, TiO₂, TaO₂, ZrO₂, HfO₂, Si₃N₄, Y₂O₃,AlON, TaCN, and ZrSi.
 15. The method of claim 10, wherein theselectively removing of the inhibitor includes plasma dry etching,chemical dry etching, ashing, wet etching, or a combination thereof. 16.A method, comprising: providing a structure having a substrate, asemiconductor fin over the substrate, two source/drain (S/D) regionsover the semiconductor fin, a first dielectric layer over thesemiconductor fin, an isolation structure adjacent to sidewalls of thesemiconductor fin, one or more channel semiconductor layers over thefirst dielectric layer and connecting the two S/D regions, and a gatestructure wrapping around the one or more channel semiconductor layers,wherein the gate structure is disposed at a frontside of the structure;thinning down the structure from a backside of the structure opposite tothe frontside of the structure until the semiconductor fin is exposedfrom the backside of the structure; selectively etching thesemiconductor fin to form a trench, wherein the trench exposes surfacesof the two S/D regions, the first dielectric layer, and the isolationstructure; forming a silicide feature on the surfaces of the S/Dregions; selectively depositing an inhibitor in the trench and on thesilicide feature but not on the surfaces of the first dielectric layerand the isolation structure; selectively depositing a dielectric linerlayer in the trench and on the surfaces of the isolation structure andthe first dielectric layer but not on the surfaces of the inhibitor;selectively removing the inhibitor; depositing a dielectric layer tofill the trench; etching the dielectric layer to form a via hole, thevia hole exposing the silicide feature on one of the two S/D regions;and forming a via structure in the via hole.
 17. The method of claim 16,wherein the silicide feature includes titanium silicide (TiSi), nickelsilicide (NiSi), tungsten silicide (WSi), nickel-platinum silicide(NiPtSi), nickel-platinum-germanium silicide (NiPtGeSi),nickel-germanium silicide (NiGeSi), ytterbium silicide (YbSi), platinumsilicide (PtSi), iridium silicide (IrSi), erbium silicide (ErSi), andcobalt silicide (CoSi), or a combination thereof.
 18. The method ofclaim 17, wherein the inhibitor includes an organic film havingamphiphilic molecules.
 19. The method of claim 18, wherein thedielectric liner layer includes one of La₂O₃, Al₂O₃, SiOCN, SiOC, SiCN,SiO₂, SiC, ZnO, ZrN, Zr₂Al₃O₉, TiO₂, TaO₂, ZrO₂, HfO₂, Si₃N₄, Y₂O₃,AlON, TaCN, and ZrSi.
 20. The method of claim 19, wherein theselectively removing of the inhibitor includes a wet etching with SPMcleaning solution at a temperature over 100° C.